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Ag thin films were prepared on the float-glass substrate by DC magnetron sputtering?method. The relationship of surface morphology/electrical properties with technical conditions was?investigated. The experimental results showed that sputtering power, sputtering pressure and?substrate temperature had effects on the morphology and electrical properties of Ag thin films. The?optimum parameters were obtained with sputtering power of 100 W，sputtering pressure of 0.4 Pa
and substrate temperature of 130 °C. Under the optimum parameters, the deposited Ag thin film was?smooth and its resistivity was as low as 1.96×10-8 Ω·m.