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Chemically vapor deposited diamond films were etched at different parameters using?oxygen plasma produced by a DC (direct current) glow discharge and then polished by a modified?mechanical polishing device. Scanning electron?microscope, atomic force microscope and Raman?spectrometer were used to evaluate the surface states of diamond films before and after polishing.?It was found that a moderate plasma etching would produce a lot of etch pits and amorphous?carbon on the top surface of diamond film. As a result, the quality and the efficiency of mechanical?polishing have been enhanced remarkably.