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Hard, nanocomposite aluminum magnesium boride thin films were prepared on Si (100) substrates with?a three target magnetron sputtering system. The films were characterized by X-ray diffraction, atomic?force microscope, electron micro-probe, Fourier transform infrared spectroscopy and nanoindentation.?The results show that the maximum hardness of the as-deposited films is about 30.7 GPa and these films?are all X-ray amorphous with smooth surfaces. The influences of substrate temperature and boron?sputtering power on the quality of the films are discussed. From the results of this work, magnetron?sputtering is a promising method to deposit AleMgeB thin films.